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Microwave Plasma Sources and Methods in Processing Technology. Ladislav Bardos
Читать онлайн.Название Microwave Plasma Sources and Methods in Processing Technology
Год выпуска 0
isbn 9781119826897
Автор произведения Ladislav Bardos
Издательство John Wiley & Sons Limited
12 Index
List of Figures
1 Chapter 1Figure 1.1 Graphical illustration of the frequencies and wavelengths...Figure 1.2 Construction of the magnetron tube consists of the anode...Figure 1.3 The electric and magnetic fields in the waveguides...Figure 1.4 Schematic description of the reflection of...Figure 1.5 Formation of the standing waves by waves moving in the waveguide...Figure 1.6 Typical construction of coaxial cables...Figure 1.7 Principle of construction of an air-filled coaxial line with possible...Figure 1.8 Examples of coupling arrangements. (a) A stub...Figure 1.9 Typical microwave power line for generation of a discharge...Figure 1.10 Schematic sketch of typical microwave power...Figure 1.11 Sketch of the ferrite circulator based on the wave deflection....Figure 1.12 Schematic illustration of the three-stub...Figure 1.13 Schematic sketch of the E-H tuner. Both arms...Figure 1.14 Loop-type double directional coupler. Coaxial connectors...Figure 1.15 Illustrations of typical 90° waveguide bends in...Figure 1.16 An illustration of a choke-type flange connection...Figure 1.17 Microwave caused damage of an ordinary Viton...Figure 1.18 Construction of a sealed ceramic window for...Figure 1.19 (a) Tapered waveguide. (b) Four sections of...Figure 1.20 Examples of waveguide attenuators...Figure 1.21 An illustration of the microwave load with the water tube...Figure 1.22 An example of the waveguide phase shifter with...Figure 1.23 Shorting plungers for rectangular waveguides...Figure 1.24 The simple smooth transition between a rectangular and a...Figure 1.25 Distributions of the electric and magnetic fields in the cylindrical waveguide...Figure 1.26 Examples of the coupling between a resonator...Figure 1.27 Typical service arrangement with multiple mic...Figure 1.28 Shapes of typical air-cooled microwave magnetron...Figure 1.29 Schematic illustrations of heating arrangements in the microwave...Figure 1.30 A view into a typical microwave oven with the power outlet arranged...Figure 1.31 An illustration of simple circuitry used with magnetron...Figure 1.32 An illustration of the mercury (Hg) plasma generated by the microwave...
2 Chapter 2Figure 2.1 Simple schematic description of the phases of matter and the formation...Figure 2.2 Idealized scheme of an avalanche process of the gas breakdown...Figure 2.3 Shape of the Paschen curve showing a minimum breakdown voltage...Figure 2.4 Idealized description of the plasma oscillations...Figure 2.5 Schematic representation of a planar RHP electromagnetic...Figure 2.6 Graphical illustration of the plasma generation...Figure 2.7 Schematic representation of the electron and ion currents...Figure 2.8 Schematic representation of the electron and ion currents, space...Figure 2.9 The sheath thickness in the RF discharge in...Figure 2.10 Comparisons of typical electron densities and energies in plasmas...Figure 2.11 Typical microwave systems for the plasma generation at reduced...Figure 2.12 Optical emission spectra from nitrogen plasma generated by the...
3 Chapter 3Figure 3.1 Schematic representation of the particle and energy interactions...Figure 3.2 The homogeneous and heterogeneous reactions...Figure 3.3 Schematic representation of possible processes at negative...Figure 3.4 Effects of the gas pressure on the particle transport...Figure 3.5 Time-resolved and space-resolved afterglows...Figure 3.6 The effect of the duty-cycle in a pulsed plasma...
4 Chapter 4Figure 4.1 Microwave magnetoactive plasma systems...Figure 4.2 Comparison of the theoretical model of the plasma oxidation...Figure 4.3 The optical emission spectra of the microwave-generated...Figure 4.4 Schematic of the waveguide system for microwave generation of...Figure 4.5 Detail of the experimental arrangement with 25 mm...Figure 4.6 The non-uniform oxygen microwave plasma led to a non...Figure 4.7 Experimental arrangement with the magnetic coil surrounding...Figure 4.8 An illustration of the effect of auxiliary magnetic field on the geometry...Figure 4.9 Comparison of the power dependencies of the plasma...Figure 4.10 The simple test system for generation of the microwave magnetoactive...Figure 4.11 The plasma density vs radius of the plasma in the discharge tubes...Figure 4.12 The comparison of dependencies of the plasma density on the incident...Figure 4.13 Schematic of the experimental system for oxidation of silicon samples...Figure 4.14 The oxide thickness vs time on 25 mm diameter silicon samples in...Figure 4.15 Oxides on Si samples vs oxidation time at 2 kW power...Figure 4.16 The floating potential vs the plasma density....Figure 4.17 Dependence of the floating potential in the oxygen plasma...Figure 4.18 A uniform oxide formed on 40 mm diameter Si...Figure 4.19 Experimental arrangement for the oxidation of silicon and for test...Figure 4.20 Axial decaying of the saturated ion curren...Figure 4.21 A divergent geometry of the microwave magnetoactive plasma...Figure 4.22 Floating potential of the W probe along the decaying magnetic...Figure 4.23 Floating potential measured in the axis of the plasma...Figure 4.24 Floating potential measured by a flat electrode plate with diameter...Figure 4.25 Laboratory arrangement for PE CVD of...Figure 4.26 Schematic of the experimental...Figure 4.27 The system (left) operating with the Surfatron-generated...Figure 4.28 Comparison of the optical emission intensities of the background...Figure 4.29 Comparison of the power functions of the intensities of...Figure 4.30 Comparison of the total gas pressure functions of intensities...Figure 4.31 The comparison of the optical emission intensities...Figure 4.32 A set of the power thyristors coated by...Figure 4.33 The time dependency of the far afterglow PE...Figure 4.34 The 2 mm diameter argon plasma slab generated...Figure 4.35 The PE CVD system with the plasma antenna generated...Figure 4.36 Detail of the movable short for the reactor with the central holder of...Figure 4.37 Adjusting the reactor length L to resonance at two...Figure 4.38 (a) Diamond film deposited on Mo substrate in the...Figure 4.39 The Surfajet system with 15 cm inner diameter ...Figure 4.40 Photographs of the ball plasma generated in...Figure 4.41 Pressure dependence of the maximum growth rate...Figure 4.42 Power dependence of the maximum growth rate...Figure 4.43 An example of thick CNx films grown at 10 W microwave...Figure 4.44 The SEM images of fibrous structures of the...Figure 4.45 An aluminum foil substrate coated 10 minute by the...Figure 4.46 Vibrational temperature of the N2 (C3Πu) emission system...Figure 4.47 Comparison of the cylindrical antenna (a) and a conical antenna...Figure 4.48 Comparison of the normalized saturated ion currents in the plasma...Figure 4.49 Surfajet discharges in N2 + C2H2 at microwave power of 50 W and...Figure 4.50 A filter-paper substrate coated 10 min by the...Figure 4.51 Schematic illustration of the hybrid plasma source...Figure 4.52 The front view of the HYP source for the 2.4 GHz...Figure 4.53 View on the argon plasma at 6 mTorr (0.8 Pa) pressure...Figure 4.54 The ion density and electron temperature measured by double...Figure 4.55 The scanning electron microscope (SEM...Figure 4.56 The ESCA depth profile in the 1.5 μm thick TiN...Figure 4.57 Vacuum chamber (horn antenna) of the HYP source...Figure 4.58 A principal design of an automatic industrial device for coating...
5 Chapter 5Figure 5.1 The Paschen curve data for breakdown voltage...Figure 5.2 Plasma torches in air at atmospheric pressure at...Figure 5.3 Examples of the most frequently used cold atmospheric plasma systems...Figure 5.4 Examples of the high frequency and microwave powered cold...Figure 5.5 The H-HEAD source with a microwave antenna working...Figure 5.6 The effect of the pulsed DC hollow cathode...Figure 5.7 The cold plasma jet at low power generated without a...Figure 5.8 Comparison of lengths of the atmospheric plasma jets generated...Figure 5.9 Dependency of the argon plasma plume length at...Figure 5.10 The test equipment for generation of a brush-shaped atmospheric...Figure 5.11 The contact angles on the H-HEAD plasma treated DC 01...Figure 5.12 An increased hydrophobicity on the right part of the carbon...Figure 5.13 Improvement of the lacquer adhesion on DC 01 steel after...Figure 5.14 About a 5-second oxidation of the Si sample by H-HEAD...Figure 5.15 Dependence of the optical emission intensity of the Fe line...Figure 5.16 The H-HEAD plasma sintering of powders. Parameters on the...Figure 5.17 Experimental arrangement with the H-HEAD source generating the air...Figure 5.18 The scanning electron microscope (SEM) image of nanocluster grains...Figure 5.19 Comparison of the Raman spectrum of the nanocluster diamond...Figure 5.20 The SEM image of MoO3 formations on both surfaces of the Mo...Figure 5.21 The SEM image of bizarre creation of the molybdenum trioxide grown...Figure 5.22 The SEM of the nano-diamonds on the stainless steel substrate...Figure 5.23 The system with pulsed power of 2.4 GHz, up to 1 kW in